FIELD: technological processes.
SUBSTANCE: invention relates to technological processes and can be used for laser annealing of plates from semiconductor, ceramic and glass-like materials. Method for laser treatment of non-metal plates, which involves irradiation of their surface with a pulse of laser radiation with the energy density depending on the temperature of annealing, initial temperature of the plate, specific heat capacity and density of the plate material, as well as the plate material absorption index at the wavelength of the laser radiation, performed is a preliminary heating of the plate to a certain temperature.
EFFECT: technical result is exclusion of the plates destruction by thermoelastic stresses in the process of treatment and higher yield of nondefective plates.
1 cl, 1 dwg
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Authors
Dates
2016-11-20—Published
2015-08-14—Filed