FIELD: technological processes.
SUBSTANCE: invention relates to technological processes and can be used for laser annealing of plates of semiconductor, ceramic and glass-like materials. In the method of laser processing of non-metallic plates, consisting in irradiation of their surface with laser radiation pulse with energy density, depending on annealing temperature, initial temperature of plate, specific heat capacity and density of material of plate, as well as the plate material absorption factor at the laser radiation wavelength, the plate is preheated to a certain temperature.
EFFECT: elimination of destruction of plates by thermoelastic stresses during processing and increase of yield of suitable plates.
1 cl, 1 dwg
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Authors
Dates
2019-06-18—Published
2018-10-25—Filed