FIELD: technological processes.
SUBSTANCE: invention relates to technological processes and can be used for laser annealing of plates of semiconductor, ceramic and glass-like materials. Disclosed is a method of laser processing of non-metallic plates, consisting in irradiation of their surface with continuous laser radiation with energy density sufficient for annealing temperature to reach plate surface. According to the disclosed method, the plate is preheated to a temperature which enables to meet the criterion of thermal strength.
EFFECT: elimination of destruction of plates by thermoelastic stresses during processing and increase of yield of suitable plates.
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Authors
Dates
2019-04-18—Published
2018-06-20—Filed