FIELD: household appliances.
SUBSTANCE: invention relates to microwave equipment and can be used for production of holders for substrates, on which films or coatings of different materials, in particular, carbon (diamond) films or coatings are being formed by plasma chemical vapour-phase deposition. Substrate holder is made in the form of a disk of refractory high-temperature transition metal, and the upper surface of the holder is polished, and the lower surface of the holder has annular grooves formed by concentric circles. Between the annular grooves there are outer and central heat-removing elements in the form of annular ledges and central heat-removing element, which is a ledge in the form of a circle.
EFFECT: higher uniformity of distribution of temperature field on the surface of the holder, which provides uniform thickness growth of the film.
11 cl, 3 dwg, 2 ex
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