FIELD: machine building.
SUBSTANCE: invention refers to SHF plasma reactors for plasma-chemical synthesis of substance out of gas phase. SHF plasma reactor consists of pressure tight axis-symmetric radial wave-guide. A padding and a padding holder are installed in the central part of the wave guide. A side of the holder external relative to the padding is connected with the wave heater. Between the padding holder and the heat exchanger, with a gap relative to a wall of the reactor, there is installed a heat removing element of shape, wherein area of section cross to symmetry axis of the heat removing element decreases as distance from the padding grows.
EFFECT: invention facilitates uniform temperature of padding holder due to selective heat removing element ensuring fabrication of uniform qualitative films of material in SHF plasma reactor without additional devices of control and inspection.
7 cl, 4 dwg
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Authors
Dates
2010-06-27—Published
2008-12-03—Filed