METHOD FOR PROCESSING THE BEAM OF NEUTRAL PARTICLES BASED ON THE TECHNOLOGY FOR PROCESSING THE BEAM OF GAS CLUSTER IONS AND OBTAINED BY SUCH AS A PRODUCT Russian patent published in 2018 - IPC H05H3/02 C23C26/00 

FIELD: technological processes.

SUBSTANCE: invention relates to a method for treating the surface of an optical element and also to treating a surface of an optical coating formed on the surface of an optical substrate, forming a surface barrier coating on a hygroscopic crystalline material, an optical element and a hygroscopic substrate. In carrying out the method for treating the surface of the optical element, the following steps are performed on which a chamber with a reduced pressure is provided, in which a cluster of gas cluster ions is formed, accelerate the gas cluster ions with the formation of a beam of accelerated gas cluster ions along the trajectory of said beam. Then, the fragmentation and/or dissociation of at least a portion of the accelerated gas cluster ions along the path of said beam is stimulated. Then, charged particles are removed from the beam of accelerated gas cluster ions to form an accelerated neutral beam of neutral gas clusters and/or neutral monomers along the path of said beam and hold the optical element on the trajectory of the generated accelerated neutral beam. Then, at least a portion of the surface of the optical element is treated by irradiating it with the generated accelerated neutral beam. Stimulation and removal steps are performed prior to said irradiation of the surface of the optical element.

EFFECT: creation of devices and methods for forming doped and/or deformed films and/or introduction of impurity atomic particles in the surface of semiconductor or other materials, the treated surfaces having interfaces with the underlying substrate material, which exceed the known methods and devices of traditional treatment with a cluster of gas cluster ions (GCIB).

35 cl, 26 dwg, 1 tbl