FIELD: electricity.
SUBSTANCE: invention can be used for development of microwave field transistors on semiconductor heterostructure. Essence of the invention consists in the fact that a high-power microwave field-effect transistor on a semiconductor heterostructure with quantum barriers comprises a semiconductor substrate, a buffer layer, sequence of at least one layer of wide-bandgap and one layer of narrow-bandgap materials of semiconductor heterostructure AlGaAs-InGaAs-GaAs with given characteristics, wherein in the channel layer there is at least one additional system of layers doped with a donor impurity, separated from the channel on each side by a barrier layer of AlxGa1-xAs with a thickness of at least 1 nm with a molar fraction of a chemical element of 0.05 < Alx < 0.4, or at least one barrier layer of i-AlAs with thickness of 2-6 atomic monolayers, or a combination of barrier layers AlxGa1-xAs and i-AlAs, wherein the layers of i-AlAs are separated by at least one layer of narrow-gap material GaAs with thickness of at least 2 atomic monolayers or AlxGa1-xAs with molar fraction of the chemical element Alx < 0.4 with thickness of at least 2 atomic monolayers, and an undoped GaAs layer is located between the additional system of donor-doped layers and the barrier layers on at least one side.
EFFECT: high specific output power of a microwave field effect transistor on a semiconductor heterostructure while maintaining the gain.
4 cl, 2 dwg, 1 tbl
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RU2563544C1 |
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Authors
Dates
2025-04-14—Published
2024-09-12—Filed