FIELD: microwave equipment.
SUBSTANCE: development and production of a wide range of microwave electronic devices. In the semiconductor heterostructure of a powerful microwave field-effect transistor, at least two quantum barrier layers of i-AlAs are additionally made, each with a thickness of 2-6 atomic monolayers, each of the mentioned quantum barrier layers is made in part of the semiconductor heterostructure - between a layer doped with an acceptor impurity (p) of a group of AlxGa1-xAs barrier layers and the actual channel layer InyGa1-yAs, or a group of layers of the latter with different mole fractions (y) of the chemical element indium (Iny), quantum barrier layers are separated from each other by at least one layer of narrow-gap material AlxGa1-As, each with a mole fraction (x) of the chemical element Alx less than 0.4, with a thickness equal to or more than 2 atomic monolayers.
EFFECT: providing the ability to increase the output power and gain of a high-power microwave field-effect transistor based on a semiconductor heterostructure.
4 cl, 2 dwg, 1 tbl
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SEMICONDUCTOR NANO-STRUCTURE WITH COMPOSITE QUANTUM WELL | 2004 |
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RU2278072C2 |
Authors
Dates
2024-02-12—Published
2023-11-16—Filed