FIELD: technological processes.
SUBSTANCE: invention relates to a method for producing thin magnetic nanogranular films. Method comprises sequentially depositing a thin film of a ferromagnetic metal oxide onto a heat-resistant substrate and a layer of reducing metal at room temperature, followed by vacuum annealing of the resulting two-layer film. Layer of ferromagnetic metal oxide is applied by high-frequency magnetron sputtering of a metal cobalt target in the atmosphere from a mixture of gases consisting of 70 % argon and 30 % oxygen at room temperature. On the resulting layer, a layer of aluminum is deposited as a reduction metal by the method of low-frequency magnetron sputtering in an atmosphere of pure, not less than 99.99 %, argon, after which vacuum annealing of the resulting two-layer film is carried out at a temperature of 700 °C.
EFFECT: technical result consists in simplifying the technology of film production, there is no agglomeration of magnetic nanogranules, providing the ability to synthesize films with magnetic nanogranules of a given size from one to hundreds of nanometers with a small dispersion of magnetic nanogranules.
1 cl, 2 dwg, 1 ex
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Authors
Dates
2018-07-12—Published
2017-08-04—Filed