METHOD OF MICRO-PROFILING SURFACE OF MULTICOMPONENT GLASS Russian patent published in 2019 - IPC C03C21/00 C03C15/00 B82Y20/00 

FIELD: chemistry.

SUBSTANCE: invention relates to methods of producing nanostructured materials, in particular to a method of applying a given relief on the glass surface with a characteristic lateral resolution of the order of hundreds of nanometers. Method of micro-profiling surface of multicompartmental glass comprises two-stage treatment of glass surface, in which at first stage surface of glass is brought into contact with template with specified micro profile, which is anode, on one side, and with a flat cathode, which is a substrate holder, on the other side, is placed in a chamber furnace in which glass is heated to a temperature in range of 50 °C to a temperature lower by 20...30 °C of the transition temperature of the glass, constant voltage 0.1–10 kV during 3–350 minutes is applied simultaneously with heating of glass to anode, after which the glass sample is inertially cooled in the chamber furnace and electric voltage is removed. At the second step, a sample of glass with a modified surface is subjected to plasma-chemical etching at pressure of 0.1–10 Pa, wherein inductively bound plasma is formed in a mixture of sulphur hexafluoride gases and oxygen in ratio 3:1 under action of radio-frequency gas discharge, wherein plasma-chemical etching is carried out until required depth of preset micro profile is achieved.

EFFECT: technical result is possibility of formation in glass of nano- and micro profiles with depth of relief from tens of nanometers to several microns, geometry of which corresponds to negative image of used template-electrode, shorter time for application of profiles.

1 cl, 4 dwg