FIELD: optics; optoelectronics.
SUBSTANCE: invention relates to optical and optoelectronic industries and can be used in making image sensors, photodetectors and solar cells. Antireflection optical coating based on ion-implanted layer of porous germanium on substrate of monocrystalline germanium contains thin surface layer of porous structure of germanium with thickness of 30 nm with ion-implanted impurity of indium. Said layer is made by implantation of monocrystalline germanium substrate with indium ions with energy of 5–50 keV, radiation dose 1.0⋅1015–1.8⋅1016 ion/cm2 and current density in ion beam 1–15 mcA/cm2.
EFFECT: layer made in such a way prevents increased reflection from germanium surfaces.
1 cl, 2 dwg
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Authors
Dates
2024-04-09—Published
2023-07-07—Filed