FIELD: optical; optoelectronic industry.
SUBSTANCE: invention relates to individual elements of devices such as image sensors, photodetectors, solar cells, etc., constructed using the semiconductor - germanium. A method for manufacturing an anti-reflection optical coating based on porous germanium includes the formation of an anti-reflection optical coating with a porous germanium structure by implanting a single-crystal germanium substrate with indium ions with an energy of 5-50 keV, radiation dose 1.0⋅1015 –1.0⋅1016 ions/cm2 and the current density in the ion beam is 1-15 mcA/cm2.
EFFECT: possibility of forming a thin-layer anti-reflection optical coating with a porous germanium structure.
1 cl, 2 dwg
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Authors
Dates
2023-10-16—Published
2023-07-07—Filed