SOURCE OF FAST NEUTRAL MOLECULES Russian patent published in 2020 - IPC H01J27/04 

FIELD: technological processes.

SUBSTANCE: invention relates to vacuum-plasma engineering, namely to sources of fast neutral molecules, mainly to sources of flows of large cross-section of fast neutral molecules for etching and heating of articles in working vacuum chamber, in particular, before application of coatings on them in order to increase adhesion and quality of coatings. Source of fast neutral molecules comprises gas-discharge chamber, discharge power supply, positive pole of which is connected to anode of gas-discharge chamber, and negative pole is connected to its cathode, working vacuum chamber for placing processed articles, accelerating grid arranged between gas-discharge chamber and working vacuum chamber and connected to the latter through resistor, accelerating voltage source, positive pole of which is connected to anode of gas-discharge chamber, and negative pole is connected to accelerating grid, according to the invention, the accelerating grid is made in the form of a set of parallel plates perpendicular to the plane of separation of the gas-discharge chamber and the working vacuum chamber, and the cathode of the gas-discharge chamber is made in the form of a cold hollow cathode with an emission hole facing towards the accelerating grid.

EFFECT: higher efficiency of treated articles cleaning due to exclusion of last foreign impurities.

1 cl, 1 dwg