INCREASING THE STEEPNESS OF THE VAC OF HIGH-CURRENT FIELD ELECTRON SOURCES Russian patent published in 2022 - IPC H01J9/02 B82B1/00 B82B3/00 

Abstract RU 2765635 C1

FIELD: vacuum-plasma electronics.

SUBSTANCE: invention relates to the field of vacuum-plasma electronics, in particular to the development and creation of radiation-resistant devices and devices whose operation is based on the use of field electron sources, and can be used in the manufacture of white light sources, flat cathodoluminescent screens and displays. The expected result of the invention is achieved by reducing the specific surface resistances of diamond-graphite film structures and nanodiamond coatings, as well as by increasing the duration and frequency of anode voltage pulses when operating electron sources in pulsed periodic electric fields.

EFFECT: lowering the auto-emission threshold and increasing the steepness of the volt-ampere characteristics (VAC) of field electron sources manufactured using nanodiamond film coatings.

1 cl, 3 dwg

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RU 2 765 635 C1

Authors

Yafarov Andrej Ravilevich

Zolotykh Dmitrij Nikolaevich

Yafarov Ravil Kyashshafovich

Dates

2022-02-01Published

2021-04-20Filed