FIELD: technological processes.
SUBSTANCE: invention relates to device for vacuum-plasma application of metal double-sided coating on piezofilms. Said device comprises vacuum chamber with ion-plasma sputtering source and piezofilm holders. Piezofilm holders are made in the form of frames, each of which is installed on a bushing equipped in horizontal plane with four protrusions of parabolic shape and installed with possibility of rotation around its axis. Bushing for the above frames are installed on the rotating base at equal distances from the center of rotation. Each bushing is made with possibility of rotation through 90 degrees after each passage of the rotating base through the fixed fixing device in the form of a rod located at a distance from the said bushing less than the value of its protrusions. In particular cases of the invention implementation each frame is made in the form of a mask.
EFFECT: possibility of applying metal coatings of required configuration on piezoelectric films on both sides in one process cycle.
1 cl, 1 dwg
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Authors
Dates
2022-03-24—Published
2021-08-06—Filed