FIELD: X-ray devices.
SUBSTANCE: invention relates to X-ray devices applicable as an integral part of the X-ray source for the tasks of X-ray nanolithography. The invention is intended to test the concept of X-ray lithography based on a synchrotron radiation source in the wavelength range from 6.6 to 13.5 nm. The matrix consists of X-ray windows and two layers, the first of which has a higher thermal conductivity and dissipates heat, and the second produces most of the X-ray radiation generated by the shooting target. An additional control compensation electrode is formed to prevent electrostatic deflection of the matrix of perforating targets, while the first heat-conducting layer is structurally combined with X-ray windows and is a single element - a perforated anode electrode.
EFFECT: invention provides the ability to create a multi-beam stream of parallel directed X-ray radiation generated by a matrix of perforating targets in the required wavelength range with increased linear directivity, which contributes to the formation of a clearer topological pattern with a resolution of up to 20 nm.
1 cl, 5 dwg
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Authors
Dates
2022-06-29—Published
2021-12-21—Filed