FIELD: laser annealing methods.
SUBSTANCE: invention relates to a method for laser annealing of non-metallic materials and can be used for laser annealing of semiconductor, ceramic and glassy materials. The surface is irradiated with a laser pulse of a rectangular time shape with the required energy density. The initial laser pulse is divided by a dielectric mirror with a reflection coefficient of 20% into two pulses, and the second pulse is timed for the duration of the first pulse. The power density in the first pulse is 80% of the power density in the initial laser beam.
EFFECT: increasing the yield of suitable products in the process of laser annealing of non-metallic materials by reducing thermoelastic stresses and reducing the area of possible spall fracture of the material.
1 cl, 3 dwg, 1 ex
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