DEVICE FOR SYNTHESIS AND COATING DEPOSITION Russian patent published in 2017 - IPC C23C14/35 H01J37/317 

Abstract RU 2620845 C1

FIELD: machine engineering.

SUBSTANCE: device comprises a vacuum chamber, a planar magnetron with a planar target and discharge power supply connected to the positive pole of the vacuum chamber and the negative pole to the target. The camera is installed and it is electrically connected to the hollow body. The planar magnetron is installed on the bottom of the housing. On the walls of the housing near the target surface flow, the channels are formed in the carrier gas, and chamber walls - flow channels therein reactive gas.

EFFECT: increase device performance by increasing the coating deposition rate.

1 dwg

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RU 2 620 845 C1

Authors

Metel Aleksandr Sergeevich

Grigorev Sergej Nikolaevich

Volosova Marina Aleksandrovna

Melnik Yurij Andreevich

Bolbukov Vasilij Petrovich

Dates

2017-05-30Published

2015-12-17Filed