METHOD FOR DIFFUSION WELDING OF SINGLE-CRYSTAL SILICON AND GLASS Russian patent published in 2023 - IPC B23K20/14 B23K20/22 

FIELD: instrumentation.

SUBSTANCE: production of sensitive elements used in the manufacture of micromechanical accelerometers, microgyroscopes, integral pressure sensors. The method for diffusion welding of single-crystal silicon and glass includes heating the package, isothermal exposure, and supplying a constant voltage to the package. This isothermal exposure is carried out for two hours, and after the voltage is applied, the current passing through the package being welded is monitored until it stops. Then, additional isothermal exposure of the welded package is carried out for two hours, after which controlled cooling is carried out at a rate of 1 to 4 deg/min.

EFFECT: reduction of residual internal stresses arising in a package of glass and single-crystal silicon, causing an increase in the accuracy characteristics of manufactured micromechanical sensors.

1 cl, 4 dwg, 1 ex