METHOD FOR DEPOSITION OF PVD COATING ON MULTIFACETED SUBSTRATES Russian patent published in 2023 - IPC C23C14/24 C23C14/50 C23C14/56 

FIELD: coating production.

SUBSTANCE: method for obtaining a diamond-like carbon nanostructured coating (PVD coating) on trifacial substrates having a central hole by physical vapor deposition. A PVD source and a planetary mechanism with these substrates are placed in the vacuum chamber and PVD coatings are applied during the rotation of the planetary mechanism with these substrates while simultaneously rotating these substrates around their axis of symmetry in the direction opposite to the direction of rotation of these substrates around their common axis. As a PVD source, a rectangular PVD source is used, placed on the outer side of these substrates symmetrically with respect to their common axis of rotation. These substrates are installed around their common axis of rotation with an angular step equal toα₀=2π/(m⋅λ+1), ensuring the location of one of the edges of each specified substrate when positioning at the location of the rectangular PVD source opposite the plane of its radiation. These substrates are given rotation around their axes of symmetry with a frequency equal to n_p=n_k⋅ (m+1/λ), Whereα₀ is the angular step of the substrates around their common axis of rotation, rad, m=5 is an integer, n_p is the frequency of rotation of each substrate around its axis, rpm, n_k=3 rpm is the frequency of rotation of the substrates around their common axes,λ=3 is the number of faces of the substrate, which is coated.

EFFECT: uniform conditions for coating multifaceted substrates and the location of the working faces of the substrates at a given angle to the flow direction near the PVD source.

1 cl, 1 dwg, 1 ex