SPUTTERED MAGNETRON ASSEMBLY FOR DEPOSITION OF COMPOSITE MULTICOMPONENT FILMS NiCoFe Russian patent published in 2023 - IPC C23C14/35 C23C14/14 

FIELD: magnetron sputtering.

SUBSTANCE: sputtered magnetron assembly for deposition of composite multicomponent films Ni_0.60Co_0.3Fe_0.1. Said magnetron assembly contains a target, is configured to be rigidly attached to the magnetron coaxially with it, and additionally contains a lower plate made of cooled copper. The target contains a first plate made of iron, a second plate made of cobalt and an outer plate made of nickel. The four plates are arranged in parallel and mounted on the same axis. In the emission zones of the second and outer plates there are slots located on the same axis symmetrically relative to their center. For the outer plate, the area of the zone with which the emission of nickel particles is equal to sNi=s-s_prNi. For the second cobalt plate, the total area of the zone from which cobalt particles are emitted is equal to sCo =s_prNi-s_prCo. The total area of the zone on the first iron plate from which iron particles are emitted is equal to sFe=s_prCo. In this case, s is the area of the emission zone of a nickel plate in the form of a ring, s_slNi is the total area of the slots in the form of holes located symmetrically relative to the center of the emission zone of the outer nickel plate, s_slCo is the total area of the slots located symmetrically relative to the center of the emission zone of the second cobalt plates.

EFFECT: obtaining a design of a sputtered magnetron assembly, which allows the formation of flows of components of the deposited film Ni_0.60Co_0.3Fe_0.1 identical in energy spectrum and increasing the total heat flux emitted by the target.

1 cl, 4 dwg, 1 ex