FIELD: metallurgy.
SUBSTANCE: invention relates to a magnetron target for depositing a film of a binary alloy from tantalum and titanium TaxTi1-x, wherein x>0.5. Said target comprises two metal plates arranged parallel to each other and made with possibility of rigid attachment to magnetron coaxially with it. Internal cooled plate is made of titanium, and the external plate is made of tantalum. In the outer plate there are two slots in the form of ring sectors with an angle of less than 120°. Said slots are located symmetrically relative to the centre of the target.
EFFECT: enabling creation of a magnetron target, which enables to deposit films from a binary alloy TaxTi1-x at x>0.5.
1 cl, 4 dwg, 1 ex
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