SPUTTERED MAGNETRON ASSEMBLY FOR THE V-NB-MO-TA MEDIUM-ENTROPY FOUR-COMPONENT ALLOY FILMS DEPOSITION Russian patent published in 2025 - IPC C23C14/35 C23C14/14 

FIELD: chemistry.

SUBSTANCE: disclosed is sputtered magnetron assembly for deposition of films of medium-entropy four-component alloy V_0.25Nb_0.25Mo_0.25Ta_0.25. Said assembly contains parallel-arranged sprayed metal plates, designed with the possibility of installation on the same axis with the magnetron and rigidly attached to it, and an additional lower cooled copper plate. Spraying assembly consists of four sprayed metal plates. Inner plate is made from tantalum in form of solid disc. Other three plates are successively made from molybdenum, niobium and vanadium and are in form of rings whose inner radii provide equal streams of tantalum, molybdenum, niobium and vanadium. Magnetron has an annular sputtering zone.

EFFECT: design of the sputtered magnetron unit, which provides deposition of films of medium-entropy four-component alloy V_{0_25}Nb_{0_25}Mo_{0_25}Ta_{0_25}.

1 cl, 3 dwg, 2 tbl