FIELD: spraying.
SUBSTANCE: invention relates to a magnetron sputtering system. It consists of a vertical carousel with substrates located in the centre of the vacuum chamber, and magnetron sources located inside the vacuum chamber on its periphery. Detachable screens are arranged between magnetron sources. Each detachable screen is an anode and is made with possibility to prevent mixing of sputtered materials from two nearby working magnetron sources. Magnetron sources are made with possibility of rotation through angle of 90-120°, around a vertical axis located on one of the vertical sides of the magnetron source.
EFFECT: providing sputtering of various materials with maximum efficiency on extended substrates with free access to the surface of the substrate holder and the surface of targets without increasing the distance between magnetron sources, with maximum arrangement of the number of magnetron sources inside the hood of the vacuum installation.
3 cl, 2 dwg
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