METHOD OF PRODUCING NANOSTRUCTURED FILM OF MAGNESIUM OXIDE MgO (100) ON SURFACE OF METAL SUBSTRATE IN FORM OF ATOMICALLY CLEAN SURFACE OF TUNGSTEN CRYSTAL W (100) OR RHENIUM Re (1000) WITH ORIENTATION WHICH ENABLES TO OBTAIN SAID FILM Russian patent published in 2025 - IPC C23C14/08 C23C14/16 C23C14/24 B82Y30/00 

FIELD: chemistry.

SUBSTANCE: invention relates to a method of producing a nanostructured film of magnesium oxide MgO (100) on the surface of a metal substrate in the form of an atomically clean surface of a crystal of tungsten W (100) or rhenium Re (1000) with an orientation which enables to obtain said film. Ultrahigh vacuum is provided in the vacuum chamber. MgO powder deposited on tungsten coil is heated to temperature of 2500–2850 °C and said powder is evaporated, followed by deposition of MgO molecules on said substrate to obtain said nanostructured film of magnesium oxide MgO (100).

EFFECT: obtaining a nanostructured film of magnesium oxide MgO (100) on the surface of said metal substrate while maintaining the oxide-metal interface at the atomic level.

1 cl, 3 ex