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1 501 756

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A1

(51)

IPC

(21) (22)

Application

4305020/21, 1987-09-10

(22)

Actual filing date

1987-09-10

(45)

Published

1996-02-20

(72)

Inventor

Bunin G.G.Kurmachev V.A.Mjakinenkov V.I.Nikolenkov V.T.Pavlova G.E.

METHOD FOR MANUFACTURING PHOTOGRAPHIC PATTERNS Russian patent published in 1996 - IPC

Abstract SU 1501756 A1

FIELD: photography. SUBSTANCE: method involves applying masking coating layer, made of, for example, chromium, and electric resistor layer onto glass or quartz sublayer. The electric resistor is exposed to electron beam, developed and doubled in a thermostat. The sublayer is treated in ultra high frequency field having specific power of 0,2-0,8 W/cm2 during 10-60 s. Then, layer etching is applied to the masking coating. EFFECT: uniformly heated electrode resistor layer; removed stress, solvent residual and humidity; improved adhesion properties. 1 tbl

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SU 1 501 756 A1

Authors

Bunin G.G.

Kurmachev V.A.

Mjakinenkov V.I.

Nikolenkov V.T.

Pavlova G.E.

Dates

1996-02-20—Published

1987-09-10—Filed

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