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Application

4943843/21, 1991-05-23

(22)

Actual filing date

1991-05-23

(45)

Published

1995-05-20

(72)

Inventor

Smoljanitskij I.Ja.Kononov A.N.Artemova N.D.Polikarpov D.P.Ogurtsov A.I.Jakovlev A.T.Meshcherjakov S.A.Shul'Gin A.A.

METHOD OF FORMING MICROIMAGES Russian patent published in 1995 - IPC

Abstract SU 1834530 A1

FIELD: microelectronics. SUBSTANCE: electron resist is illuminated in sequence and under program control by electron beam in form of square-shaped dies. Sizes of dies are determined by maximal density of beam cross-section at focusing plane. After that latent image is developed. Current density and width of the die are chosen from the relation given in the description of the invention. EFFECT: improved efficiency of process; optimized thermal conditions of illumination. 4 dwg, 4 tbl

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SU 1 834 530 A1

Authors

Smoljanitskij I.Ja.

Kononov A.N.

Artemova N.D.

Polikarpov D.P.

Ogurtsov A.I.

Jakovlev A.T.

Meshcherjakov S.A.

Shul'Gin A.A.

Dates

1995-05-20—Published

1991-05-23—Filed

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