METHOD OF GROWING MONOCRYSTALLINE SiC Russian patent published in 1996 - IPC

Abstract SU 882247 A1

FIELD: crystal chemistry. SUBSTANCE: monocrystalline SiC is grown by sublimation of a SiC source in presence of Ta in amount at least 1% based on the SiC source weight placed in crucible onto SiC substrate at 1600-2000 C. EFFECT: reduced density of defects and increased crystal volume.

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SU 882 247 A1

Authors

Vodakov Ju.A.

Mokhov E.N.

Ramm M.G.

Roenkov A.D.

Dates

1996-11-20Published

1980-07-02Filed