FIELD: vacuum deposition of thin films by plasma-beam spraying. SUBSTANCE: cathodic unit has target cathode mounted in guides for linear displacement by drive. Electretomagnetic shields are positioned along guides. EFFECT: increased efficiency of unit by optimum arrangement of target cathode and uniform spraying over the whole surface of it. 2 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| CATHODE JOINT FOR IONIC-PLASMA APPLICATION OF THIN FILMS IN VACUUM | 1992 |
|
RU2074904C1 |
| DESIGN OF CATHODE UNIT FOR APPLICATION OF FILMS IN VACUUM | 1993 |
|
RU2089659C1 |
| CATHODE UNIT FOR PRODUCTION OF THIN FILMS IN VACUUM | 1993 |
|
RU2089660C1 |
| CATHODE UNIT | 1993 |
|
RU2089661C1 |
| CATHODE UNIT | 1993 |
|
RU2089658C1 |
| APPARATUS FOR COOLING SUBSTRATES IN VACUUM | 1993 |
|
RU2046838C1 |
| DEVICE FOR CONVEYING SUBSTRATES IN VACUUM UNIT | 1992 |
|
RU2020190C1 |
| CATHODE DEVICE FOR APPLICATION OF COATINGS BY ION-PLASMA METHOD | 1991 |
|
RU2023744C1 |
| DEVICE FOR APPLICATION OF FILMS IN VACUUM | 1991 |
|
RU2007500C1 |
| CLEAN ROOM | 1994 |
|
RU2074930C1 |
