PLASMAPOLYMERIZATION METHOD Russian patent published in 1995 - IPC

FIELD: microelectronics. SUBSTANCE: at least one of components of polymer forming gas is additionally introduced in zone of plasma luminescence to activate it. Unsaturated compositions (aliphatic cyclical, aromatic) are used as at least one of components of polymer forming gas. Additionally introduced in zone of plasma luminescence component of polymerforming gas is used as plasma forming gas. Temperature of base is kept in limits from 20 to 60 C. Argon is used as plasma forming gas with its consumption of 20-200 сm³/min and pressure in reactor is kept equal to 0.1 1 mm.Hg. Derivatives of benzene are used as component of polymer forming gas, that is introduced in plasma luminescence zone, and methylmethacrylate is used as component, introduced in zone of after luminescence of plasma. Consumption of each of the components of polymer forming gas is kept equal of 1-10 сm³/min. EFFECT: increased sped of polymer deposition in zone of plasma after luminescence. 6 cl, 5 dwg, 2 tbl