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Application

93053794/02, 1993-11-29

(22)

Actual filing date

1993-11-29

(45)

Published

1997-02-20

(72)

Inventor

Vologirov A.G.Ivashov E.N.Kondrashov P.E.Orinchev S.M.Sleptsov V.V.Stepanchikov S.V.

(73)

Holder

Moskovskij Gosudarstvennyj Institut Ehlektroniki I Matematiki Universitet)

METHOD OF ADMITTING GAS INTO VACUUM CHAMBER Russian patent published in 1997 - IPC

Abstract RU 2073745 C1

FIELD: treatment of materials in vacuum. SUBSTANCE: invention is aimed at providing uniform admission of gas all over the surface of material under treatment with controlling gas stream. The task is achieved by using as porous material that with efficient adsorption capacity, for example, zeolite, whereas cooling and heating systems are placed in wall made of said porous material. EFFECT: provided uniformity in gas admission. 3 cl, 1 dwg

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RU 2 073 745 C1

Authors

Vologirov A.G.

Ivashov E.N.

Kondrashov P.E.

Orinchev S.M.

Sleptsov V.V.

Stepanchikov S.V.

Dates

1997-02-20—Published

1993-11-29—Filed

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