FIELD: tests of supersmooth surfaces with nanometric level of roughness. SUBSTANCE: process includes direction on to examined surface of collimated beam of X-ray radiation at sliding angle θ = θc÷(θc+0,4o), where θc - is critical angle, scanning of examined surface with beam of X-ray radiation, measurement of intensity of reflected radiation by means of strip of photodiodes and determination of value of roughness by measured parameters. Device testing roughness incorporates X-ray radiation source with collimator, scanning platform to position sample with examined surface and strip of photodiodes to measure intensity of X-ray radiation reflected from examined surface. X-ray radiation source with collimator is so installed with regard to examined surface that it ensures sliding angle of θ = θc÷(θc+0,4o) of collimated X-ray radiation, where θc - is critical angle. Invention makes it feasible to increase area examined by one measurement to 104 mm2 sq.mm and to improve spatial resolving power to value of the order of 1 mm. EFFECT: increased examined area and improved resolving power. 13 cl, 12 dwg
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Authors
Dates
1999-04-10—Published
1998-04-20—Filed