ION SOURCE Russian patent published in 2001 - IPC

Abstract RU 2176133 C2

FIELD: ion sources of cyclotrons ( internal, of closed type ). SUBSTANCE: withdrawing electrode of ion source is so manufactured that it becomes possible to install stage of differential evacuation between discharge chamber ( anode ) with gas emanating from it and region of vacuum of cyclotron for multiple reduction of value of gas flow from source into cyclotron high vacuum. EFFECT: reduced loss of ion beams. 2 dwg

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RU 2 176 133 C2

Authors

Zubarev A.V.

Dates

2001-11-20Published

1999-06-15Filed