METHOD OF VACUUM DEPOSITION OF FILMS AND DEVICE FOR REALIZATION OF THIS METHOD Russian patent published in 2002 - IPC

Abstract RU 2190036 C2

FIELD: vacuum engineering; vacuum deposition of films. SUBSTANCE: proposed method includes forming electron beam, acting on this beam by accelerating voltage, evaporation of target material by electron beam and its deposition on substrate; target material is subjected to additional cooling by directional thermal radiation. Device proposed for realization of this method has thermionic cathode, screen, power supply source and cylindrical heating element located coaxially relative to rod made from sublimated material and connected with this rod and with positive terminal of power supply source. EFFECT: improved quality of films; increased rate of evaporation. 3 cl, 1 dwg

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RU 2 190 036 C2

Authors

Kulov S.K.

Pergamentsev Ju.L.

Platov Eh.A.

Kesaev S.A.

Dates

2002-09-27—Published

2000-07-13—Filed