SHF PLASMA REACTOR Russian patent published in 2010 - IPC C23C16/513 H05H1/30 

Abstract RU 2403318 C2

FIELD: power engineering.

SUBSTANCE: reactor comprises tight axisymmetric chamber with channels for gas and radial wave guide installed in it, central part of which is a SHF resonator, holder of substrate, collector, gas heat exchanger and toroid membrane. Gas heat exchanger comprises a cylindrical chamber installed coaxially with a substrate holder. Toroid membrane forms a U-shaped semi-wave train in section and is arranged between radial wave guide and substrate holder. Substrate holder is arranged as cylindrical, axisymmetric, massive of heat resistant and heat conductive metal. One of channels for gas is arranged as axial and is connected to cylindrical chamber of heat exchanger, and the other channel for gas - with collector. Cylindrical chamber is connected to side of specified holder, which is reverse towards substrate and SHF discharge, contacts with it on area from 30 to 90% of area of reverse side of holder, and is connected to collector by means of gap. Substrate holder is connected to radial wave guide via toroid membrane.

EFFECT: invention provides for maintenance of uniform temperature on substrate of larger area.

5 cl, 1 dwg

Similar patents RU2403318C2

Title Year Author Number
SHF PLASMA REACTOR 2008
  • Atezhev Vladimir Vasil'Evich
RU2393270C1
MICROWAVE PLASMA REACTOR FOR OBTAINING A HOMOGENEOUS NANOCRYSTALLINE DIAMOND FILM 2016
  • Ashkinazi Evgenij Evseevich
  • Ralchenko Viktor Grigorevich
  • Bolshakov Andrej Petrovich
  • Sedov Vadim Stanislavovich
  • Konov Vitalij Ivanovich
RU2644216C2
UHF PLASMA REACTOR WITH REGULATION OF TEMPERATURE OF INDIRECT SUBSTRATE HEATING 2019
  • Ashkinazi Evgenij Evseevich
  • Ralchenko Viktor Grigorevich
  • Ryzhkov Stanislav Gennadievich
  • Bolshakov Andrej Petrovich
  • Sedov Vadim Stanislavovich
  • Konov Vitalij Ivanovich
RU2762222C1
METHOD FOR MONITORING AND CONTROLLING THE TEMPERATURE REGIME OF THE GROWTH SURFACE OF THE SUBSTRATE 2020
  • Ashkinazi Evgenij Evseevich
  • Ralchenko Viktor Grigorevich
  • Ryzhkov Stanislav Gennadievich
  • Bolshakov Andrej Petrovich
  • Konov Vitalij Ivanovich
  • Filin Sergej Aleksandrovich
RU2763103C1
UHF PLASMA REACTOR 2005
  • Konov Vitalij Ivanovich
  • Ral'Chenko Viktor Grigor'Evich
  • Sergejchev Konstantin Fedorovich
  • Khavaev Valerij Borisovich
  • Vartapetov Sergej Karenovich
  • Atezhev Vladimir Vasil'Evich
RU2299929C2
MICROWAVE PLASMOCHEMICAL REACTOR FOR PRODUCING SYNTHETIC DIAMONDS 2022
  • Shevchenko Mikhail Iurevich
  • Altakhov Aleksandr Sergeevich
  • Krandievskii Sviatoslav Olegovich
  • Mudretsov Dmitrii Valentinovich
  • Alekseev Andrei Mikhailovich
RU2803644C1
APPARATUS FOR PLASMA CHEMICAL DEPOSITION OF DIAMOND COATINGS 2020
  • Ashkinazi Evgenij Evseevich
  • Ralchenko Viktor Grigorevich
  • Ryzhkov Stanislav Gennadevich
  • Bolshakov Andrej Petrovich
  • Konov Vitalij Ivanovich
  • Filin Sergej Aleksandrovich
RU2763713C1
SUBSTRATE HOLDER 2015
  • Sizov Yurij Evgenevich
  • Lyashchev Aleksej Valerevich
  • Ralchenko Viktor Grigorevich
  • Bolshakov Andrej Petrovich
  • Volin Roman Igorevich
  • Belashov Igor Valerevich
RU2607110C1
MICROWAVE PLASMA REACTOR 2023
  • Subbotin Roman Sergeevich
  • Udalov Valentin Nikolaevich
  • Minakov Pavel Vladimirovich
RU2804043C1
PLASMA MICROWAVE REACTOR 2016
  • Vikharev Anatolij Leontevich
  • Gorbachev Aleksej Mikhajlovich
  • Lobaev Mikhail Aleksandrovich
RU2637187C1

RU 2 403 318 C2

Authors

Ral'Chenko Viktor Grigor'Evich

Sergejchev Konstantin Fedorovich

Dates

2010-11-10Published

2008-12-03Filed