FIELD: physics.
SUBSTANCE: multistage photoelectric converter with a nanostructure antireflection coating is based on a multilayer AIGaInP/GaInP/Ga(In)As/Ge semiconductor structure. The photoelectric converter has rear and front ohmic contacts and a multilayer nanostructure antireflection coating formed on the front surface of the structure in places free of ohmic contacts, consisting of three layers: SiO2 with thickness of 70-80 nm, Si3N4 with thickness of 25-35 nm and TiOX, where x=1.8-2.2, with thickness of 20-30 nm.
EFFECT: multistage photoelectric converter has high efficiency and low coefficient of reflection in the shortwave and longwave region of the solar spectrum.
5 ex, 1 dwg
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Authors
Dates
2011-12-10—Published
2010-06-28—Filed