MULTISTAGE PHOTOELECTRIC CONVERTER WITH NANOSTRUCTURE ANTIREFLECTION COATING Russian patent published in 2011 - IPC H01L31/04 B82B1/00 

Abstract RU 2436191 C1

FIELD: physics.

SUBSTANCE: multistage photoelectric converter with a nanostructure antireflection coating is based on a multilayer AIGaInP/GaInP/Ga(In)As/Ge semiconductor structure. The photoelectric converter has rear and front ohmic contacts and a multilayer nanostructure antireflection coating formed on the front surface of the structure in places free of ohmic contacts, consisting of three layers: SiO2 with thickness of 70-80 nm, Si3N4 with thickness of 25-35 nm and TiOX, where x=1.8-2.2, with thickness of 20-30 nm.

EFFECT: multistage photoelectric converter has high efficiency and low coefficient of reflection in the shortwave and longwave region of the solar spectrum.

5 ex, 1 dwg

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RU 2 436 191 C1

Authors

Andreev Vjacheslav Mikhajlovich

Malevskaja Aleksandra Vjacheslavovna

Gudovskikh Aleksandr Sergeevich

Zadiranov Jurij Mikhajlovich

Dates

2011-12-10Published

2010-06-28Filed