FIELD: electricity.
SUBSTANCE: test structure comprises a metal conductor with two outputs to connect a source of currents and two potential outputs to measure voltage drops as current flows through the conductor. An additional metal conductor is connected at the side to the metal conductor, besides, this conductor has current and potential outputs at the free end and a potential output in area of its connection to the conductor. Metal conductors are tested on this test structure for reliability.
EFFECT: higher information value regarding permissible metallisation current density with account of metal layout features in an integral microcircuit chip.
5 dwg
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