FIELD: physics.
SUBSTANCE: present invention relates to a capacitive micromachined ultrasonic transducer, a system for generating or detecting ultrasonic waves and a method of making the transducer. The disclosed group of inventions includes a capacitive micromachined ultrasonic transducer, a system for generating or detecting ultrasonic waves having the transducer, and methods of making the transducer. The capacitive micromachined ultrasonic transducer has a silicon substrate, a cavity, a first electrode situated between the silicon substrate and the cavity, wherein the first electrode is situated below the cavity, a membrane situated above the cavity and opposite the first electrode, a second electrode situated inside or near the membrane, wherein voltage can be applied across the first electrode and the second electrode, and a first insulating layer between the first electrode and the second electrode, said first insulating layer containing a dielectric. The system for generating or detecting ultrasonic waves has a transducer according to the present invention. Described is a method of making a transducer according to the present invention, wherein the transducer is made using a CMOS manufacturing process, and the transducer can be made by a post-process in a CMOS process.
EFFECT: preventing charging by adding additional layers and obtaining transducers with stable characteristics by setting at least one barrier which is situated on the path of charge carriers to break flow of charge carriers starting at one electrode and directed towards the other electrode.
13 cl, 4 dwg
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Authors
Dates
2014-04-10—Published
2009-09-08—Filed