FIELD: electricity.
SUBSTANCE: method comprises of the steps of depositing the first electrode layer on a substrate, depositing the first dielectric film on the first electrode layer, depositing the sacrificial layer on the first dielectric film, where the sacrificial layer being is removable to form the transducer cavity, depositing the second dielectric film on the sacrificial layer and depositing the second electrode layer on the second dielectric film, forming a pattern in at least one (s) deposited layers and films. They are carried out by means of atomic-layer deposition in one single sequence of processing and the formation of the pattern is carried out by a descending technology.
EFFECT: possibility of creating a transducer with improved performance.
15 cl, 5 dwg
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