FIELD: process engineering.
SUBSTANCE: invention relates to generation of electron or photon pattern on substrate, application of fluoropolymer to this end, to method of pattern generation and to electron or photon device thus made. Proposed method comprises: formation of film of said electron or photon material on said substrate and application of said fluoropolymer for protection of said electron or photon material in pattern generation.
EFFECT: ease of integration of proposed process with all common TFT architectures.
44 cl, 18 dwg
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