FIELD: technological processes.
SUBSTANCE: proposed group of inventions relates to deposition reactors, in which material is deposited on surfaces by successive self-saturated surface reactions. Method of atomic-layer deposition of coating on surface of particles, in which atomic-layer deposition reactor with particle vessel is applied, on surface of which coating is applied, in reaction chamber, providing a source of vibration isolated from outside the reaction chamber and transmitting vibrations along the fore-vacuum line, or isolated inside the reaction chamber. Coating is applied on particles arranged inside vessel by means of self-saturated surface reactions with application of downward directed flow of precursor passing through vessel, and cause movement of particles inside vessel by means of isolated vibration source when coating on particles. Reactor for implementing said method comprises a reaction chamber in which there is a particle vessel on whose surface a coating is applied, and said source of vibration. Reactor is configured to coat the particles inside the vessel using self-saturated surface reactions using a downwardly directed precursor stream.
EFFECT: facilitating movement of particles inside the vessel using an isolated vibration source when coating the particles; obtaining a more homogeneous coating on particles with prevention of their sticking by means of vibrations without undesirable vibrations of the reactor housing.
23 cl, 7 dwg
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Authors
Dates
2020-07-29—Published
2016-09-16—Filed