FIELD: metallurgy.
SUBSTANCE: invention relates to reactor and to deposition of metal plies on the substrate. Reactor feeder confines the expansion space meant for forcing the reagents as a downward flow from plasma source (110) to reaction chamber. Expansion space is expanded toward the reaction chamber (335). Lifting mechanism is meant for loading of at least one substrate (360) in reaction chamber from top side of reaction chamber (335).
EFFECT: deposition by means of serial self-saturating surface reactions.
13 cl, 17 dwg
| Title |
Year |
Author |
Number |
| ATOMIC LAYER DEPOSITION WITH PLASMA SOURCE |
2011 |
- Kilpi, Vjajne
- Li, Vej-Min
- Malinen, Timo
- Kostamo, Jukhana
- Lindfors, Sven
|
RU2584841C2 |
| DEVICE FOR DEPOSITION OR CLEANING WITH MOBILE STRUCTURE AND METHOD FOR ITS OPERATION |
2020 |
|
RU2748658C1 |
| DEVICE FOR DEPOSITION OR CLEANING WITH MOVABLE STRUCTURE AND METHOD OF OPERATION THEREOF |
2017 |
|
RU2727634C1 |
| ATOMIC LAYER DEPOSITION REACTOR FOR PROCESSING BATCH OF SUBSTRATES AND METHOD OF PROCESSING BATCH OF SUBSTRATES |
2011 |
- Lindfors, Sven
- Sojninen, Pekka J.
|
RU2586956C2 |
| METHOD AND DEVICE FOR DEPOSITION REACTORS |
2009 |
|
RU2502834C2 |
| APPARATUS FOR PLASMA PROCESSING OF SUBSTRATES |
2019 |
|
RU2789412C1 |
| METHOD OF LOADING THE SUBSTRATE INTO ASO REACTOR |
2012 |
- Kilpi, Vyajne
- Kostamo, Yukhana
- Li, Vej-Min
|
RU2620230C2 |
| APPLICATION OF COATING ON FINE PARTICLES USING ATOMIC DEPOSITION UNIT |
2012 |
- Lindfors, Sven
- Sojninen, Pekka J.
|
RU2600042C2 |
| ATOMIC LAYER DEPOSITION APPARATUS AND METHOD OF LOADING ATOMIC LAYER DEPOSITION APPARATUS |
2009 |
- Lindfors, Sven
- Poutiajnen, Jukha Allan Kustaa-Adolf
|
RU2518845C2 |
| COATING FABRIC SUBSTRATE BY DEPOSITION OF ATOMIC LAYERS |
2012 |
|
RU2600462C2 |
