FIELD: physics.
SUBSTANCE: nitride semiconductor ultraviolet light-emitting element comprises: a base structure which includes a sapphire substrate (0001) and an AlN layer formed on the substrate; and a section of the structure of the light-emitting element, which includes an n-type coating layer of an n-type AlGaN semiconductor layer, an active layer, having an AlGaN semiconductor layer, a p-type coating layer of a p-type AlGaN semiconductor layer, wherein said n-type coating layer, active layer and p-type coating layer are formed on the base section of the structure. The plane (0001) of the substrate is inclined at an angle of 0.6-3.0°, and the molar ratio of AlN of the n-type coating layer is equal to greater than 50%.
EFFECT: invention improves the crystal quality of an AlGaN-based semiconductor layer formed on a sapphire substrate by optimising the inclination angle, and increases light-emitting output of the nitride semiconductor ultraviolet light-emitting element.
5 cl, 13 dwg
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