FIELD: physics.
SUBSTANCE: invention relates to reactors for deposition of materials on the surface with successive usage of self-confined surface reactions. Method for atomic layer deposition (ALD) of coating on particles' surface of disperse material includes installation of cartridge for atomic layer deposition (ALD cartridge) in ALD reactor receiver by means of quick-detachable connection, wherein ALD cartridge is configured to function as ALD reaction chamber, disperse material surface treatment in ALD cartridge by processing of disperse material in cartridge compartments located one above another, each of which is separated from adjacent compartment by plate-type filter. Coating ALD reactor on disperse material particles' surface comprises receiver configured for installation in ALS reactor by means of quick-detachable connection of ALD cartridge, configured to perform function of ALD reaction chamber, and line or lines of feeding configured to supply precursors' vapors into ALD cartridge for implementation of disperse material surface treatment in ALD cartridge. ALD cartridge is a detachable cartridge, which by means of receiver by means of quick-detachable connection is attached to ALD reactor body, wherein possibility of disperse material surface treatment inside cartridge is provided. Said cartridge includes plate-type filters arranged one above another to make compartments for dispersed material coating. Device for coating ALD on surface of dispersed material particles contains said ALD reactor and ALD cartridge.
EFFECT: providing thin coating on fine particles allowing to change their surface properties without changing of their volume properties.
17 cl, 12 dwg
