EXTENDED CATHODE MAGNETRON SPUTTERING SYSTEM Russian patent published in 2016 - IPC H01J37/00 C23C14/35 

FIELD: physics.

SUBSTANCE: magnetron sputtering system comprises a vacuum chamber, an anode, an extended cathode in the form of a hollow cylinder capable of rotating and a magnetic system, wherein the magnetic system consists of a magnetic system internal part which is fixed within the cathode along its axis and consisting of a magnetic conductor with three parallel rows of permanent magnets, the peripheral rows of magnets are closed at the ends by end magnets and have the polarity which is opposite to the polarity of the central row of magnets, and a magnetic system external part which is fixed equidistant from the magnetic system internal part, while enclosing the cathode on the side opposite the sputtering zone, and consists of a magnetic conductor with two parallel rows of permanent magnets having the polarity identical to the polarity of the peripheral rows of magnets of the magnetic system internal part.

EFFECT: saving the cathode material and improving the efficiency of the process of coating outer surfaces of bodies of revolution.

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