FIELD: materials.
SUBSTANCE: invention relates to atomic layer deposition reactors, in which material is applied on surfaces with successive use of self-confined surface reactions. Method for of thin-film coating application on web surface by atomic layer deposition (ALD) includes supply of coated web into atomic layer deposition reactor reaction space, formation in reaction space for coated web of trajectory with repeating configuration and provision of coated web availability in reaction space for supply of precursors by separated in time pulses for applying on said web of material by means of successive self-confined surface reactions. Precursors pulses are supplied from reaction space side in precursors gases horizontal flow. ALD thin-film coating application device on web surface contains input gateway, configured with possibility to introduce moving covered web into material application reactor reaction space, trajectory setting elements, configured with possibility to generate in reaction space trajectory with repeating configuration for coated web, and precursors vapors supply unit, configured to ensure availability of coated web in reaction space for supply of precursors by separated in time pulses for said material applying on said web. Precursors vapors supply unit contains at least one flow distributor, made with possibility of enabling precursors gases horizontal flow. Flow distributor is located on reaction space side. ALD production line for thin-film coating application on web surface as one of modules comprises said device with possibility of coating application using said method.
EFFECT: enabling possibility of ALD reactor adjustment to required production line speed for coated web processing.
14 cl, 6 dwg
