FIELD: technological processes.
SUBSTANCE: group of inventions relates to a precipitation reactor for depositing a coating on particles and a deposition method using said reactor. Reactor comprises reaction chamber providing reaction space for particles to be coated and vibration source. Deposition reactor is configured to coat particles using self-saturated surface reactions and with possibility of particles movement with vibration source when coating on particles. Deposition reactor contains a vibration-conducting part located between particles to be coated. Method of sedimentation by means of deposition reactor includes application of coating on particles with the help of self-saturated surface reactions and movement of particles during application of coating on particles by means of a vibration-conducting part located between particles to be coated.
EFFECT: providing uniform coating on particles and preventing sticking of particles during coating application.
14 cl, 7 dwg
Title | Year | Author | Number |
---|---|---|---|
COATING ON PARTICLES BY ATOMIC LAYER DEPOSITION | 2016 |
|
RU2728343C1 |
METHOD AND DEVICE FOR DEPOSITION OF ATOMIC LAYERS | 2012 |
|
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METHOD AND DEVICE FOR DEPOSITION REACTORS | 2009 |
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APPARATUS FOR PLASMA PROCESSING OF SUBSTRATES | 2019 |
|
RU2789412C1 |
DEPOSITION REACTOR WITH PLASMA SOURCE | 2011 |
|
RU2571547C2 |
METHOD AND DEVICE FOR ATOMIC LAYER DEPOSITION | 2015 |
|
RU2702669C2 |
ATOMIC LAYER DEPOSITION REACTOR FOR PROCESSING BATCH OF SUBSTRATES AND METHOD OF PROCESSING BATCH OF SUBSTRATES | 2011 |
|
RU2586956C2 |
DEVICE AND METHODS FOR ATOMIC LAYER DEPOSITION | 2016 |
|
RU2728189C1 |
DEVICE FOR DEPOSITION OR CLEANING WITH MOBILE STRUCTURE AND METHOD FOR ITS OPERATION | 2020 |
|
RU2748658C1 |
Authors
Dates
2021-01-26—Published
2020-07-20—Filed