FIELD: machine building.
SUBSTANCE: invention relates to machine building, particularly, to devices for synthesis of coatings on articles in working vacuum chamber. Device for synthesis of coatings comprises a working vacuum chamber, installed inside the latter with formation of a zone of rotation of articles, a device for planetary rotation of articles, a bias voltage source connected by a positive pole to the working vacuum chamber and a negative pole with the products planetary rotation device, target of planar magnetrons on walls of working vacuum chamber and power supplies of magnetrons, connected by negative poles with corresponding targets, additionally is equipped with installed inside rotation zone of products on axis of working vacuum chamber and isolated from it rod anode, connected with positive poles of power supplies of magnetrons.
EFFECT: high quality of synthesized coatings due to uniformity of properties of synthesized coatings and improved adhesion thereof.
1 cl, 2 dwg
Title | Year | Author | Number |
---|---|---|---|
DEVICE FOR SYNTHESIS AND DEPOSITION OF METAL COATINGS ON CURRENT-CONDUCTING ARTICLES | 2016 |
|
RU2649904C1 |
DEVICE FOR SYNTHESIS OF COATINGS ON DIELECTRIC PRODUCTS | 2017 |
|
RU2658623C1 |
DEVICE FOR SYNTHESIS OF COATINGS | 2013 |
|
RU2531373C1 |
APPARATUS FOR SYNTHESIS OF NANOSTRUCTURED COATINGS | 2014 |
|
RU2583378C1 |
DEVICE FOR COATING DEPOSITION | 2017 |
|
RU2656480C1 |
DEVICE FOR SYNTHESIS AND COATING DEPOSITION | 2015 |
|
RU2620845C1 |
DEVICE FOR COATING SYNTHESIS | 2017 |
|
RU2657896C1 |
GAS-DISCHARGE SPUTTERING APPARATUS BASED ON PLANAR MAGNETRON WITH ION SOURCE | 2020 |
|
RU2752334C1 |
MAGNETRON SPUTTERING DEVICE | 2022 |
|
RU2794524C1 |
DEVICE FOR PRECIPITATION OF METAL FILMS | 2012 |
|
RU2510984C2 |
Authors
Dates
2019-10-11—Published
2018-11-28—Filed