FIELD: electricity.
SUBSTANCE: invention can be effectively used in the formation of protective and biocompatible layers of dental and orthopaedic implants, in the manufacture of electrolytic cell technological layers of thin-film integral accumulators and in chemical reactors, which operate in aggressive media and at high temperatures. There is the cathode (3), anode (4), encircling it, and the shielding electrode (5) of the cathode assembly (2) are axially symmetric in the vacuum chamber (1) with a vertically disposed longitudinal axis O-O1. The device also comprises of a magnetic system, a substrate (22) holder (21) and a power supply source (25. The cathode (3) is made of a current-conducting material, and the shielding electrode (5) is located between the cathode (3) and the anode (4). The magnetic system consists of sequentially placed first electromagnetic coil (10) with an end surface (11) in the plane perpendicular to the longitudinal axis O-O1 of the chamber (1) and the second electromagnetic coil (15). The power supply source (25) is connected to the anode (4) and the cathode (3), so that an electric arc arises between them. The cathode assembly (2) is provided with the first drive mechanism (30) with the first power unit (42) and the second drive mechanism (33). The cathode (3) is installed in the chamber (1) with its working surface (35) being in the plane perpendicular to the longitudinal axis O-O1 of the chamber and adapted to move along the longitudinal axis O-O1 of the chamber by the first drive mechanism to provide alignment of the disposition plane of the working surface (35) of the cathode (3) with the disposition plane of the end surface (11) of the first electromagnetic coil (10) and with the cathode (3) being rotatable around the longitudinal axis O-O1 of the chamber through the second drive mechanism (33).
EFFECT: invention allows you to save the optimum conditions of the cathode position in relation to magnetic fields, that makes the coating process controlled and the coating characteristics stable.
8 cl, 4 dwg
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Authors
Dates
2018-01-24—Published
2015-11-26—Filed