FIELD: antenna equipment.
SUBSTANCE: invention can be used in the production of transmitting and receiving antennas for the terahertz frequency range (from 300 GHz to 5 THz). Semiconductor structure for photoconducting antennas is epitaxially grown on a GaAs substrate with crystallographic orientation (111)A and consists of alternating layers of undoped low-temperature LT-GaAs and high-temperature silicon-doped GaAs:Si hole-type conductivity. LT-GaAs layers are grown at a ratio of arsenic and gallium fluxes greater than GaAs:Si layers doped with silicon and grown in a high-temperature regime.
EFFECT: invention makes it possible to control the concentration of point defects AsGa and thus the possibility of controlling the lifetime of photoexcited charge carriers by growing matrix matrix layers of LT-GaAs at elevated arsenic pressure.
1 cl, 1 dwg
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Authors
Dates
2018-10-30—Published
2017-09-22—Filed